The EUV Pellicle High-Speed Mapping Tool is used to measure the Extreme Ultraviolet (EUV) transmission and reflection of pellicles and other films used in EUV lithography.

• High-resolution pellicle mapping in a single frame with no data stitching or sample scanning

• Features an ultra-thin film transfer system with real-time pellicle integrity monitoring via machine vision

• Combines an easy-to-clean measurement chamber and load-lock functionality into one

• Simultaneous reflection and transmission measurements

• Integrates the Energetiq EUV Source with EUV muiltlayer optics to provide in-band illumination