The EUV High-Volume Manufacturing (HVM) Reflectometer is used to characterize the EUV photomasks and other materials used in Extreme Ultraviolet (EUV) Lithography through spectrally-sensitive reflection measurements.

The EUV Tech HVM Reflectometer, Model No. LPR-1016-HVM, uses EUV Tech’s proven Laser-Produced Plasma (LLP) EUV lightsource, multi-element EUV optical system, superior two-detector measurement system, and ultra-clean handling system for a fully-automated measurement process.

Currently, over 25 reflectometers have been delivered worldwide, providing industry-leading accuracy, precision, and repeatability.