The EUV Pellicle Transmission Measurement System is used to characterize the Extreme Ultraviolet (EUV) pellicles and other thin films used in EUV Lithography through spectrally-sensitive transmission and reflectance measurements.

• Utilizes EUV Tech’s proven Laser-Produced Plasma (LLP) EUV lightsource

• Features a multi-element EUV optical system

• Designed with an ultra-clean handling system for a fully-automated measurement process

• Transmission and reflection data is collected simultaneously resulting in industry-leading accuracy, precision, and repeatability