Press Release
EUV Tech, Inc. Develops First At-Wavelength EUV Pellicle Inspection Tool
by EUV Tech | February 18, 2016
Martinez, CA – EUV Tech announces the successful development of the first at-wavelength EUV Pellicle inspection tool. This tool was used to measure the transmission uniformity and map the thermal distribution from the absorbed EUV power on a full size pellicle. The EUV Pellicle Inspection tool expands EUV Tech’s product line of world class EUV metrology equipment to support next-generation EUV lithography.
EUV Pellicles are thin-film membranes that sit on top of a EUV photomask and act like a dust cover keeping particles off of the focal plane of the photomask. Without a pellicle the EUV photomask, which is composed of a complex structure of alternating silicon and molybdenum layers atop a glass substrate, is prone to particles and defects which can cause issues when used in manufacturing. The current generation of EUV Pellicles consists of an extremely thin film material and must meet strict uniformity requirements to be qualified to use in EUV Lithography. Until now, there was no tool that could quickly and accurately measure the uniformity of the EUV pellicle.
“Based on our long history of delivering EUV metrology equipment we were able to successfully meet the challenge of building a EUV pellicle inspection tool” said Dr. Rupert Perera, President of EUV Tech. “This is the only tool in the world that can quickly and accurately inspect the pellicle and map the EUV transmission and thermal distribution.”
The EUV Pellicle inspection tool can inspect a freestanding pellicle supported by a frame or a pellicle mounted to a mask. Various adapter plates are also available to measure smaller pellicle samples. The tool utilizes EUV Tech’s own high brightness EUV light source which is optimized for metrology applications and EUV Tech’s ultra clean transfer system that exceeds the strict standards for particulate adders per pass required for EUV lithography. EUV Tech’s Pellicle inspection tool has the precision and resolution to meet the needs of pellicle manufacturers and is a valuable metrology tool for EUV pellicle development programs and production EUV pellicle qualification.
About EUV Tech
Founded in 1997, EUV Tech is the world's leading manufacturer of at-wavelength EUV metrology equipment. EUV Tech partners with major semiconductor manufacturers and research centers across the world to deliver next generation inspection and metrology equipment for EUV lithography. Please visit euvtech.com or contact info@euvtech.com for more information.
For Further Information Contact:
EUV Tech, Inc.
1-925-229-4388