The EUV Accelerated Exposure Test (AET) Tool is used to illuminate Extreme Ultraviolet (EUV) photomasks and other materials used in EUV Lithography with a high power-density spot.

• Integrates the Energetiq EUV Source with EUV multilayer optics to provide in-band illumination

• Delivers a target dose of EUV for accelerated lifetime testing in a configurable partial-pressure gas environment (hydrogen or other specialty gasses) replicating the environment found inside an EUV scanner

• Used for photomask degradation experiments, pellicle exposure, mask repair validation, and material compatibility experiments